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Patent Abstracts on Surface Metrology


     

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* Method for compensating errors in interferometric surface metrology.

* Integrated surface metrology.

* Substrate analysis using surface acoustic wave metrology.

* 3D optical metrology method in which a structured pattern is generated on an object surface and resultant virtual pixels measured with a white-light interferogram.


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  • Patent Abstracts on Surface Metrology

Abstract Views: 218  |  PDF Views: 0

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Abstract


* Method for compensating errors in interferometric surface metrology.

* Integrated surface metrology.

* Substrate analysis using surface acoustic wave metrology.

* 3D optical metrology method in which a structured pattern is generated on an object surface and resultant virtual pixels measured with a white-light interferogram.