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Patent Abstracts on Lithography/Etching


     

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* Substrate with Multi layer Reflective Film, Reflective Mask Blank for Euv Lithography, Method of Manufacturing Reflective Mask for Euv Lithography and Method of Manufacturing Semiconductor Device.

* Systems and Methods for Lithography Masks.

* Methods of forming a Protection Layer to Protect a Metal Hard Mask Layer during Lithography Reworking Processes.


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  • Patent Abstracts on Lithography/Etching

Abstract Views: 159  |  PDF Views: 0

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Abstract


* Substrate with Multi layer Reflective Film, Reflective Mask Blank for Euv Lithography, Method of Manufacturing Reflective Mask for Euv Lithography and Method of Manufacturing Semiconductor Device.

* Systems and Methods for Lithography Masks.

* Methods of forming a Protection Layer to Protect a Metal Hard Mask Layer during Lithography Reworking Processes.