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Design and Fabrication of Plasma Based Fib System


Affiliations
1 Variable Energy Cyclotron Centre, 1/AF, Bidhan Nagar, Kolkata, India
2 Department of Instrumentation and Applied Physics, IISc, Bangalore, India
3 IISc, Bangalore, India
4 Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata, India
     

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A Plasma based high current focused ion beam (FIB) system to produce micron size ion beams of all gaseous elements has been indigenously developed. The system is capable of delivering ion currents in the focused spot in the range of few nA to 2.5 μA and the ion source delivers ion current with angular current density of more than 20 mA/Sr. These parameters are atleast three orders larger than conventional FIB systems utilizing LMIS. Few ion beam milling experiments on steel and silicon show the milling rate of about 300 μm3/s.
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  • Design and Fabrication of Plasma Based Fib System

Abstract Views: 181  |  PDF Views: 1

Authors

P. Y. Nabhiraj
Variable Energy Cyclotron Centre, 1/AF, Bidhan Nagar, Kolkata, India
Ranjini Menon
Variable Energy Cyclotron Centre, 1/AF, Bidhan Nagar, Kolkata, India
G. Mohan Rao
Department of Instrumentation and Applied Physics, IISc, Bangalore, India
S. Mohan
IISc, Bangalore, India
Jisnu Basu
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata, India

Abstract


A Plasma based high current focused ion beam (FIB) system to produce micron size ion beams of all gaseous elements has been indigenously developed. The system is capable of delivering ion currents in the focused spot in the range of few nA to 2.5 μA and the ion source delivers ion current with angular current density of more than 20 mA/Sr. These parameters are atleast three orders larger than conventional FIB systems utilizing LMIS. Few ion beam milling experiments on steel and silicon show the milling rate of about 300 μm3/s.