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Design and Fabrication of Plasma Based Fib System
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A Plasma based high current focused ion beam (FIB) system to produce micron size ion beams of all gaseous elements has been indigenously developed. The system is capable of delivering ion currents in the focused spot in the range of few nA to 2.5 μA and the ion source delivers ion current with angular current density of more than 20 mA/Sr. These parameters are atleast three orders larger than conventional FIB systems utilizing LMIS. Few ion beam milling experiments on steel and silicon show the milling rate of about 300 μm3/s.
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