Indian Journal of Engineering & Materials Sciences

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In this work, we study the effect of high gamma doses (600 kGy, 1000 kGy and 1250 kGy) on morphological, structural and optical characteristics of sputtered WO3 thin films. The modifications in these characteristics were analyzed by X-Ray Diffraction, Atomic Force Microscope, UV–Visible spectroscopy, Photoluminescence spectroscopy and Raman spectroscopy. AFM shows the variation in grain size from 61 nm to 91.2 nm after gamma irradiation from unirradiated to gamma-exposed WO3 thin films. XRD and Raman spectroscopy show the monoclinic structure before and after irradiation of WO3 thin films. The optical study illustrates the variation in the optical band gap from 2.80 eV to 2.08 eV after gamma exposure of WO3 thin films. In PL spectra, two emission peaks at a wavelength of 410 nm and 480 nm were observed.

Keywords

Thin films, RF Sputtering, Gamma Irradiation, Atomic force microscope (AFM), X-Ray Diffraction (XRD), Raman Spectroscopy.
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