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A Study on the Bulk Etch Rate of LR-115 Solid State Nuclear Track Detector Using Lithium Hydroxide as an Etching Solution


Affiliations
1 Department of Physics, Punjabi University, Patiala 147 002, India
2 Department of Physics, Sri Guru Teg Bahadur Khalsa College, Sri Anandpur Sahib 140 118, India
 

Among numerous applications of Solid-State Nuclear Track Detector (SSNTD), one important application is estimating radon and thoron concentration in an indoor environment. The primarily used SSNTD for this application is LR-115. Studying the behaviour of these SSNTDs for different etching solutions is essential. In this report, Lithium hydroxide solution was used to etch LR-115 SSNTD. The study of the thickness of the film removed is carried out at different normality of etching solution to study the effect of normality of etching solution on the bulk etch rate. The change in bulk etching rate with the change in temperature of the etching solution was also put out in this study. From the results, it is discovered that the bulk etch rate is directly proportional to the normality and temperature of the etching solution. Additionally, it can be deduced that the LiOH bulk etching rate of LR-115 has lower values when compared to those of other alkaline hydroxide etching solutions.

Keywords

Bulk Etch Rate, Normality, Temperature, LR-115, Lithium Hydroxide.
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  • A Study on the Bulk Etch Rate of LR-115 Solid State Nuclear Track Detector Using Lithium Hydroxide as an Etching Solution

Abstract Views: 134  |  PDF Views: 92

Authors

Chandan
Department of Physics, Punjabi University, Patiala 147 002, India
Deep Shikha
Department of Physics, Sri Guru Teg Bahadur Khalsa College, Sri Anandpur Sahib 140 118, India
Jaswinder Kaur
Department of Physics, Punjabi University, Patiala 147 002, India
Vimal Mehta
Department of Physics, Sri Guru Teg Bahadur Khalsa College, Sri Anandpur Sahib 140 118, India

Abstract


Among numerous applications of Solid-State Nuclear Track Detector (SSNTD), one important application is estimating radon and thoron concentration in an indoor environment. The primarily used SSNTD for this application is LR-115. Studying the behaviour of these SSNTDs for different etching solutions is essential. In this report, Lithium hydroxide solution was used to etch LR-115 SSNTD. The study of the thickness of the film removed is carried out at different normality of etching solution to study the effect of normality of etching solution on the bulk etch rate. The change in bulk etching rate with the change in temperature of the etching solution was also put out in this study. From the results, it is discovered that the bulk etch rate is directly proportional to the normality and temperature of the etching solution. Additionally, it can be deduced that the LiOH bulk etching rate of LR-115 has lower values when compared to those of other alkaline hydroxide etching solutions.

Keywords


Bulk Etch Rate, Normality, Temperature, LR-115, Lithium Hydroxide.

References